Facilities

• Cleanroom, a 2600 sq-ft class 100 cleanroom that contains equipment for solid state device fabrication, including facilities for photolithography, wet chemical etching, oxidation, diffusion, thermal evaporation, sputtering, reactive ion etching, chemical vapor deposition, and other thin film processes.
  
  
• MBE laboratory that contains two MBE machines for controlled growth of InAs, GaP, and related compound semiconductors.
  
  
• MOCVD laboratory that houses two MOCVD reactors for controlled growth of III-nitride compound semiconductors.
  
  
• Nanotechnology laboratory that has a E-beam lithography exposure tool for writing images with sub-100 nm features, and an SPM machine for imaging samples with atomic resolution.
  
  
• Optical Characterization laboratory for measuring optical properties of semiconductors and their device structures.
  
  
• Electronic Device Characterization laboratory for measuring electronic properties of semiconductor devices.
  
  
• Microelectronics Teaching laboratory that is basically a scaled-down version of the research Cleanroom for teaching students the fundamentals as well as practices of solid state device fabrication and characterization.
  
  
• The primary shared facility in the Center is the Cleanroom, which was built in 1987 with major funding from the Keck Foundation, Jones Bequest, and Yale University Science Development Fund.
  
  
• Several companies donated equipment, and/or contributed other resources to help us establish the Cleanroom. They included IBM, AT&T, Honywell, Nanometrics, Weiss Glass, etc from the µELM sponsors.