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Our laboratory emphasizes the combined use of optical spectroscopy and
optical imaging as a tool for materials characterization. The primary
spectroscopic techniques we employ are photoluminescence, photoluminescence
excitation, and molecular fluorescence. The optical techniques we use include
traditional far-field microscopy, confocal microscopy, interferometry, and
near-field optics.
We maintain four main areas of focus:
l characterization of
semiconductor nanostructures,
l characterization of
photoacids in chemically active photoresist,
l fluorescence imaging in
biomedical engineering, and
l instrumentation.
- Selected Publications
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"Calibration
and validation of projection lithography focusing by fluorescence detection of
latent photoacid images in chemically amplified resist," G.D. Feke, R.D.
Grober, G. Pohlers, et al., J. Vac. Sci. Technol. B, 20(1),
164-166 (2002). pdf
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"Spatially
resolved photoluminescence of inversion domain boundaries in GaN-based lateral
polarity heterostructures," P.J. Schuck, M.D. Mason, R.D. Grober, et al., Appl.
Phys. Lett., 79(7), 952-954 (2001). pdf
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"On-wafer
spectrofluorometric method for determination of relative quantum yields of
photoacid generation in chemically amplified resists," G.D. Feke, R.D.
Grober, G. Pohlers, et al., Anal. Chem., 73(14), 3472-3480 (2001).
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"Reflected
image of a strongly focused spot," L. Novotny, R.D.
Grober,
K. Karrai, Opt. Lett., 26(11), 789-791 (2001). pdf
- More
information at
www.eng.yale.edu/groberlab
Updated: 4/16/01
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